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A CMOS silicon spin qubit

R. Maurand, X. Jehl, D. Kotekar-Patil, A. Corna, H. Bohuslavskyi, R. Lavieville, L. Hutin, S. Barraud, M. Vinet, M. Sanquer, S. D. Franceschi·May 24, 2016·DOI: 10.1038/ncomms13575
MedicinePhysicsComputer Science

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Abstract

Silicon, the main constituent of microprocessor chips, is emerging as a promising material for the realization of future quantum processors. Leveraging its well-established complementary metal–oxide–semiconductor (CMOS) technology would be a clear asset to the development of scalable quantum computing architectures and to their co-integration with classical control hardware. Here we report a silicon quantum bit (qubit) device made with an industry-standard fabrication process. The device consists of a two-gate, p-type transistor with an undoped channel. At low temperature, the first gate defines a quantum dot encoding a hole spin qubit, the second one a quantum dot used for the qubit read-out. All electrical, two-axis control of the spin qubit is achieved by applying a phase-tunable microwave modulation to the first gate. The demonstrated qubit functionality in a basic transistor-like device constitutes a promising step towards the elaboration of scalable spin qubit geometries in a readily exploitable CMOS platform. Silicon is a promising material for realization of quantum processors, particularly as it could be naturally integrated with classical control hardware based on CMOS technology. Here the authors report a silicon qubit device made with an industry-standard fabrication process on a CMOS platform.

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